Controllable physicochemical properties of WO_x thin films grown under glancing angle

• Rupam Mandal,
• Aparajita Mandal,
• Alapan Dutta,
• Rengasamy Sivakumar,
• Sanjeev Kumar Srivastava and
• Tapobrata Som

Beilstein J. Nanotechnol. 2024, 15, 350–359, doi:10.3762/bjnano.15.31

• damage of the underlying Si substrate, which is otherwise prominent in case of DC sputtering, commonly adopted for WOx growth under GLAD configuration. For a better assessment of the present work and existing literature, a table of comparison (Table S1) is provided in Supporting Information File 1

Sputtering onto liquids: a critical review

• Anastasiya Sergievskaya,
• Adrien Chauvin and
• Stephanos Konstantinidis

Beilstein J. Nanotechnol. 2022, 13, 10–53, doi:10.3762/bjnano.13.2

Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beams

• Serguei Chiriaev,
• Luciana Tavares,
• Vadzim Adashkevich,
• Arkadiusz J. Goszczak and
• Horst-Günter Rubahn

Beilstein J. Nanotechnol. 2020, 11, 1693–1703, doi:10.3762/bjnano.11.151

• damage in polymer materials. The Pt60Pd40 alloy films were deposited by DC sputtering as described in [4], in a Cressington 208HR sputter apparatus. The Au films were deposited with an e-beam in a Cryofox Explorer 600 physical vapor deposition system. We have been using very thin metal films (5 and 15 nm

Walking energy harvesting and self-powered tracking system based on triboelectric nanogenerators

• Mingliang Yao,
• Guangzhong Xie,
• Qichen Gong and
• Yuanjie Su

Beilstein J. Nanotechnol. 2020, 11, 1590–1595, doi:10.3762/bjnano.11.141

• and deionized water were used to clean 50 μm thick PTFE films, which were then dried with nitrogen. During the etching process, DC sputtering was used on the surface of the PTFE film as a mask to deposit Au particles for 45 s. Next, a gas mixture containing O2, CF4, and Ar was introduced to the

Structural optical and electrical properties of a transparent conductive ITO/Al–Ag/ITO multilayer contact

• Aliyu Kabiru Isiyaku,
• Ahmad Hadi Ali and
• Nafarizal Nayan

Beilstein J. Nanotechnol. 2020, 11, 695–702, doi:10.3762/bjnano.11.57

• pure ITO layer (as reference) were prepared by RF and DC sputtering. The microstructural, optical and electrical properties of the ITO/Al–Ag/ITO (IAAI) films were investigated before and after annealing at 400 °C. X-ray diffraction measurements show that the insertion of the Al–Ag intermediate bilayer

• × 10−3 Ω−1). These highly conductive and transparent ITO films with Al–Ag interlayer can be a promising contact for low-resistance optoelectronics devices. Keywords: annealing; DC sputtering; figure of merit; indium tin oxide (ITO); multilayer structure; RF sputtering; Introduction Transparent

• measurements) were used as substrates. Decon90 glass cleaner was used for glass substrate cleansing. Thin film preparation A SNTEK Korea magnetron sputtering system with a dual radio frequency (RF)/direct current (DC) sputtering source with a main deposition chamber 15.7 inches in height and 23.6 inches in

Superconducting switching due to a triplet component in the Pb/Cu/Ni/Cu/Co₂Cr_1−xFe_xAl_y spin-valve structure

• Andrey Andreevich Kamashev,
• Nadir Nurgayazovich Garif’yanov,
• Aidar Azatovich Validov,
• Joachim Schumann,
• Vladislav Kataev,
• Bernd Büchner,
• Yakov Victorovich Fominov and
• Ilgiz Abdulsamatovich Garifullin

Beilstein J. Nanotechnol. 2019, 10, 1458–1463, doi:10.3762/bjnano.10.144

• . The Ni, Cu and Pb layers were prepared using e-beam techniques. For the fabrication of the HA and the Si3N4 layers dc sputtering was used. We used deposition rates of 0.4 Å/s for HA and Si3N4, 0.5 Å/s for Cu and Ni, and 10 Å/s for Pb. At first, when evaporating HA, the substrate temperature was kept

Kelvin probe force microscopy of the nanoscale electrical surface potential barrier of metal/semiconductor interfaces in ambient atmosphere

• Petr Knotek,
• Tomáš Plecháček,
• Jan Smolík,
• Petr Kutálek,
• Filip Dvořák,
• Milan Vlček,
• Jiří Navrátil and
• Čestmír Drašar

Beilstein J. Nanotechnol. 2019, 10, 1401–1411, doi:10.3762/bjnano.10.138

• crystals of 10–20 mm in length, 3–6 mm in width and up to 3 mm in thickness [31]. The surface of freshly cleaved layered Bi2Se3 single crystals was used as a substrate. The samples for the AFM measurement, Au nanoparticles (NPs) and thin films of gold or molybdenum, were prepared via DC sputtering in a SEM

• optimization of the efficiency of TE materials. Our efforts to prepare separated Mo NPs on the Bi2Se3 surface was not successful. Because Mo has significantly higher melting/boiling points (bulk Mo 2623/4639 °C, bulk Au 1064/2856 °C [47]) dc sputtering yielded homogeneous layers of Mo instead of separated NPs

• realized in the form of separated metal nanoparticles through dc sputtering, or through the local reaction/diffusion of a metallic layer irradiated with electrons or UV photons. The value of the work function barrier is measurable by KPFM at the nanoscale even in ambient atmosphere and, most importantly

Optimization of Mo/Cr bilayer back contacts for thin-film solar cells

• Nima Khoshsirat,
• Fawad Ali,
• Vincent Tiing Tiong,
• Mojtaba Amjadipour,
• Hongxia Wang,
• Mahnaz Shafiei and
• Nunzio Motta

Beilstein J. Nanotechnol. 2018, 9, 2700–2707, doi:10.3762/bjnano.9.252

• ; bilayer; chromium; DC sputtering; molybdenum; optical reflectance; Introduction Molybdenum (Mo) thin films are widely used as a back contact for photovoltaic devices such as Cu(In1−xGax)S2 (CIGS) and Cu2ZnSnS4 (CZTS) thin-film solar cells. The back contact is the first layer to be deposited and its

• . Conclusion A bilayer of Mo/Cr thin films with robust adhesion and desired electro-optical properties as a back contact in thin-film solar cells was successfully deposited on SLG substrates using DC sputtering. The bottom 10–15 nm thick Cr layer was used to increase the adhesion of the top Mo layer to the

Dealloying of gold–copper alloy nanowires: From hillocks to ring-shaped nanopores

• Adrien Chauvin,
• Cyril Delacôte,
• Mohammed Boujtita,
• Benoit Angleraud,
• Junjun Ding,
• Chang-Hwan Choi,
• Pierre-Yves Tessier and
• Abdel-Aziz El Mel

Beilstein J. Nanotechnol. 2016, 7, 1361–1367, doi:10.3762/bjnano.7.127

• The Cu nanowires were synthesized by DC sputtering in pure argon plasma of a Cu target in a confocal configuration (diameter: 76.2 mm; purity: 99.99%). The distance between the targets and the substrate was 130 mm and the angle between the magnetron source axis and the normal to the substrate was 30

Morphological and structural characterization of single-crystal ZnO nanorod arrays on flexible and non-flexible substrates

• Omar F. Farhat,
• Mohd M. Halim,
• Mat J. Abdullah,
• Mohammed K. M. Ali and
• Nageh K. Allam

Beilstein J. Nanotechnol. 2015, 6, 720–725, doi:10.3762/bjnano.6.73

• , various methods have been reported in the literature to produce amorphous and polycrystalline ZnO nanomaterials, especially in the form of nanorods. Also, several deposition methods have been reported to fabricate single-crystal ZnO nanorods, such as RF and DC sputtering [6], chemical vapor deposition

Electrical properties of single CdTe nanowires

• Elena Matei,
• Camelia Florica,
• Andreea Costas,
• María Eugenia Toimil-Molares and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2015, 6, 444–450, doi:10.3762/bjnano.6.45

• cylindrical pores of approximately 100 nm diameter. On one face of the membrane, a thin (50 nm) gold electrode is deposited by means of DC sputtering. This is further strengthened by the electrodeposition of a thick (10 μm) copper film. This membrane was then inserted into an electrochemical cell, with the

Functionalization of vertically aligned carbon nanotubes

• Eloise Van Hooijdonk,
• Carla Bittencourt,
• Rony Snyders and
• Jean-François Colomer

Beilstein J. Nanotechnol. 2013, 4, 129–152, doi:10.3762/bjnano.4.14

• recently, the functionalization of VA-CNTs arrays with platinum nanoparticles was examined by Soin et al. [121]. A method combining microwave-plasma-enhanced chemical vapor deposition and DC sputtering was employed in order to synthesize such samples. The alignment of tubes was not perturbed, no physical

Effect of large mechanical stress on the magnetic properties of embedded Fe nanoparticles

• Srinivasa Saranu,
• Sören Selve,
• Ute Kaiser,
• Luyang Han,
• Ulf Wiedwald,
• Paul Ziemann and
• Ulrich Herr

Beilstein J. Nanotechnol. 2011, 2, 268–275, doi:10.3762/bjnano.2.31

• acts as a catalyst for the hydrogen loading. Afterwards a 10 nm thick Ta adhesion layer was deposited on the polished side by DC sputtering. On top of the Ta layer, a 10 nm Cu layer was thermally evaporated. Fe nanoparticles generated in the PGC chamber were then deposited on the Cu layer for 300 s